Atomic layer reversal on CeO2 (100) surface
نویسندگان
چکیده
منابع مشابه
Atomic imaging and modeling of H2O2(g) surface passivation, functionalization, and atomic layer deposition nucleation on the Ge(100) surface.
Passivation, functionalization, and atomic layer deposition nucleation via H2O2(g) and trimethylaluminum (TMA) dosing was studied on the clean Ge(100) surface at the atomic level using scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). Chemical analysis of the surface was performed using x-ray photoelectron spectroscopy, while the bonding of the precursors to the sub...
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ژورنال
عنوان ژورنال: Science China Materials
سال: 2017
ISSN: 2095-8226,2199-4501
DOI: 10.1007/s40843-017-9082-1